Research

Metamaterials

Metamaterials, artificially structured nanomaterials, have enabled the extraordinary optical properties and unprecedented phenomena such as invisibility cloaking and negative refraction. We are designing and conducting experimental realization of novel negative index metamaterials, chiral metamaterials, hyperbolic metamaterials and metasurface working with low loss and broad bandwidth. 



Plasmonics

Due to plasmonic mode excitation of high-k vector access in dispersion relation, light can be confined to deep sub-wavelength. We are not only investigating the energy transportation mechanisms and applications at the nanometer length scale, but also studying plasmon-phonon interaction for the non-linear properties of light. 


 

Device Applications

With the properties of unnaturally high wavevectors access, super-resolution hyperlens imaging beyond diffraction limit has been demonstrated from our group. Its superior performances such as super-resolution, real-time and non-vacuum working environment open a new possibility for nanoscale biological imaging, which can be very practical. Such efforts to make metamaterials and plasmonics more practical continue to realize metadevices. Another interest is integrating metamaterials into the MEMS/NEMS devices to realize reconfigurable and actively controllable metadevices.

 

Nanofabrication and Nanomanufacturing

Metamaterials provided a huge potential to realize scientific fictions and change the world. Current metamaterials demonstration is relies on nanofabrication, so we are pursuing practical nanofabrication techniques useful for metamaterials structure realization such as ultra-high precision electron beam lithography overlay and ultra-thin/smooth thin film deposition. However, nanofabrication is very low-throughput and high-cost technologies. Experimental demonstration and applications of scalable nanomanufacutring methodologies include, but not limited to, hyperlens based 2D lithography and 3D printing (sub-50nm), plasmonic maskless flying head lithography (sub-22nm), single quantum dot patterning (sub-15nm), nano-cascade patterning (sub-10nm) and other scalable atomic/molecular level techniques such as mechanical reduction. Moreover, we are doing state-of-the-art bottom-up nanofabrication using self-assembly, nanoparticles, block co-polymer and etc to apply metamaterials and plasmonics applications. 



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